Ion shield plate for semiconductor manufacturing apparatus



FIG. 1 is a front, bottom and right side perspective view of an ionshield plate for semiconductor manufacturing apparatus according to thedesign;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2.

CLAIM The ornamental design for an ion shield plate for semiconductormanufacturing apparatus, as shown and described.